RESEARCH
Material Surfaces and Interfaces
Our research focuses on understanding and manipulating material surfaces and interfaces using advanced techniques like atomic layer deposition (ALD).
Synthesis and Surface Engineering of 2D Mxenes
Our lab focuses on developing novel approaches for synthesizing carbon-based (carbides) and nitrogen-based (nitrides) two-dimensional materials, such as MXenes. We aim to gain a fundamental understanding of their surface chemistry, which plays a crucial role in their stability, electronic properties, and interactions with different environments. By tailoring surface terminations and exploring new synthesis routes, we seek to optimize MXenes for applications in energy storage, catalysis, and electronic devices.
Atomic Layer Deposition for Lithography and Selective Depositio
We investigate thin-film synthesis using Atomic Layer Deposition (ALD) to enable precise material growth at the nanoscale. A key aspect of our research is developing advanced lithography-compatible ALD processes and selective deposition techniques for microelectronics and semiconductor applications. By combining in situ characterization with theoretical modeling, we aim to enhance control over deposition selectivity, improve patterning resolution, and contribute to next-generation electronic manufacturing technologies.
Corrosion-Resistant Thin Films for Metals and Alloys
Our lab explores new thin-film coatings to improve the corrosion resistance of metals and alloys used in harsh environments. By leveraging ALD and other deposition techniques, we develop ultra-thin, conformal protective layers that enhance durability without compromising mechanical or electrical properties. This research has broad applications, from aerospace and automotive industries to energy infrastructure, where long-term material stability is critical.
